Mechanism Stow Away JacketPas Normal Studios
Description
The concept behind Copenhagen-based Pas Normal Studios is to create cutting-edge technical apparel combined with fashion-conscious aesthetics. Sleek and minimal in its design, the Mechanism Stow Away Jacket can be easily packed away in your pocket for protection against sudden changes in weather. DWR-treated Japanese nylon acts as a fast-drying membrane to keep you dry and warm, whilst a silicone gripper at the rear deflects road spray. Finished off with printed branding at the chest and back, you won’t want to head on a ride without it. 100% Japanese Nylon Non-Fluorinated DWR Fabric Treatment Silicone Gripper Quick-Drying Printed Branding Shop All Pas Normal Studios Jackets
Product Details
- Brand: Pas Normal Studios
- Sourced from a single retailer feed
- Store: END.
Delivery & Returns
- Available now at END. with retailer-managed delivery and returns.
- Single-offer product path
- 28-day returns policy
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